From May 9 to 11, 2025, the 15th National Surface Engineering Conference, themed "Surface Engineering Innovation Drives Advancement of New Quality Productive Forces", was held in Tianjin, China. Organized by the Surface Engineering Society of the Chinese Mechanical Engineering Society and co-hosted by Tianjin University, University of Science and Technology Beijing, China University of Geosciences (Beijing), and Hainan University, with special support from Tianjin University of Technology and Education and Tianjin Huarui New Material Technology Co., Ltd., the event attracted over 1,100 attendees from universities, research institutes, and enterprises nationwide.
As a leading provider of tribological testing solutions, Universal Analytical Technology showcased internationally renowned brands it represents, including PCS, FALEX, and TANNAS&KING, at the conference. Also showcased MTM2 Micro Traction Measurement Tester from PCS Instruments. The MTM2, renowned for its precision in simulating rolling-sliding contacts and evaluating lubricant performance under extreme conditions, drew significant attention from researchers and industry representatives. Through live demonstrations and technical exchanges, attendees explored its potential applications in surface engineering for new energy equipment and wear-resistance optimization of advanced materials, highlighting Universal Analytical Technology's expertise in tribological testing solutions.
Universal Analytical Technology remains committed to introducing world-class testing technologies to advance the localization and intelligent development of surface engineering in China. Participation in this conference not only strengthened the company’s brand influence but also fostered in-depth dialogues with industry peers, paving the way for future R&D collaborations and market expansion.Moving forward, Universal Analytical Technology will continue to collaborate with global partners, leveraging innovative technologies to drive breakthroughs in China’s surface engineering sector.